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etching process中文是什么意思
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- 中文翻译
- 造句
- 刻蚀过程
- etching n. 1.蚀刻法；蚀刻(铜)版画；蚀镂术。 2.蚀刻画， ...
- process vi. 〔口语〕排队走，列队行进 〔procession ...
- etching process chemical 蚀刻制程化学品
- gravure etching process 凹版腐蚀法
- etching n. 1.蚀刻法；蚀刻(铜)版画；蚀镂术。 2.蚀刻画，蚀刻版，蚀刻版印刷品。 close [rough] etching (晶体的)精[粗]蚀。 electrochemical etching 电化浸蚀，电抛光。
- acid etching 酸蚀处理; 酸蚀刻; 酸性浸蚀
- after etching 残余腐蚀; 后腐蚀; 后侵蚀
- alkaline etching 碱腐蚀法; 碱侵蚀
- anisotropic etching 蛤异性腐蚀; 各向异性刻蚀; 各向异性蚀刻，非等向性蚀刻
- anode etching 阳极电解腐蚀
- anodic etching 阳极浸蚀法; 阳极侵蚀
- arc etching 电弧刻蚀
- batch etching 成批腐蚀
- bright etching 光亮酸蚀刻
- bring etching 光亮蚀刻
- calligraphic etching 先用钢笔和墨水在清洁的铜版上画出图形然后蚀刻的方法
- cathodic etching 阴极侵蚀; 阴极蚀刻
- catodic etching 阴极浸蚀
- chemical etching 化学腐蚀法; 化学腐蚀加工; 化学浸蚀; 化学刻蚀; 化学侵蚀法; 化学蚀刻
- chemmical etching 化学腐蚀法
- clean etching 张条凸版修整腐蚀
- clear etching 透明酸蚀刻
- close etching 精蚀晶体
- closed etching 精蚀
- color etching 着色腐蚀
- The resolution of an etching process is a measure of the fidelity of pattern transfer .
刻蚀工艺的分辨率是图形转移保真度的量度。 - Aluminium target with deep amplitude modulation fabricated by chemical wet etching process
调制靶的化学腐蚀制备工艺研究 - Studies on subsurface damage detection and wet - etching process of k9 optics
9基片的亚表面损伤探测及化学腐蚀处理技术研究 - Surface ramam spectrpscopy for in situ investigating silicon etching process
前驱体法制备氮氧化硅纳米线及其光学性能研究 - In addition , the effect of collisions and a low source power can slow down the etching process
碰撞效应和低电源功率减缓刻蚀的进程。 - John has been trying to develop a new etching process for months and he ' s finally struck oil
约翰已花了几个月的时间来创造一种新的蚀刻工序，他最终获得了成功。 - The lithographic and etching process for a membrane creates a mesh of metal wires with silicon dioxide filling the space between them
薄膜先以微影及蚀刻制程制作出金属线路，线路之间则填入二氧化矽。 - The most competitive technologies of transferring solid membrane mainly include bond and etch process and smart cut process
最具竞争力的转移固体薄膜技术主要有键合加选择性腐蚀工艺和注氢智能剥离工艺。 - To approach as a resist in dry etching processing , etching properties of the films in oxygen plasma have been investigated
为了探索该种薄膜在干刻蚀工艺过程中用作掩膜的可能性，还研究了它在氧离子体中的刻蚀性能。 - Plasma etching has been widely used in the etching process of si devices . now the study is focused on the microfabrication of compound semiconductor
等离子体干法刻蚀在硅器件的微细加工中已经得到广泛应用，目前研究的焦点集中在化合物半导体。
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Last modified time:Sun, 17 Aug 2025 00:29:56 GMT
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